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AS ISO 17560-2006 [ Withdrawn ]

Surface chemical analysis - Secondary-ion mass spectrometry - Method for depth profiling of boron in silicon

standard by Standards Australia , 10/20/2006

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Full Description

Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
 

Product Details

Edition:
1st
Published:
10/20/2006
ISBN(s):
0733777872
Number of Pages:
10
File Size:
1 file , 770 KB
Product Code(s):
10090409, 10090404, 10090419
Note:
This product is unavailable in Ukraine, Russia, Belarus