1034483

ISO 14237:2000

Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

standard by International Organization for Standardization , 02/01/2000

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This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.

 

Product Details

Published:
02/01/2000
Number of Pages:
22
File Size:
1 file , 300 KB
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This product is unavailable in Ukraine, Russia, Belarus
 

Document History

  1. ISO 14237:2010


    Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

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  2. ISO 14237:2000

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    Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials

    • Historical Version