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ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

standard by International Organization for Standardization , 07/01/2019

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ISO 21859:2019 specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

 

Product Details

Edition:
1st
Published:
07/01/2019
Number of Pages:
10
File Size:
1 file , 1.1 MB
Same As:
BS ISO 21859:2019
Note:
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