-
-
Available Formats
- Options
- Availability
- Priced From ( in USD )
-
Available Formats
-
- Immediate download
-
$104.00Members pay $78.00
- Add to Cart
-
- Printed Edition
- Ships in 1-2 business days
-
$120.00Members pay $90.00
- Add to Cart
Customers Who Bought This Also Bought
-
ISO 78-2:1999
Priced From $166.00 -
ISO 6142-1:2015
Priced From $223.00 -
ISO 21079-3:2008
Priced From $124.00 -
ISO 11039:2012
Priced From $166.00
About This Item
Full Description
This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.
Document History
-
ISO 14237:2010
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials- Most Recent
-
ISO 14237:2000
viewing
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials- Historical Version