-
-
Available Formats
- Options
- Availability
- Priced From ( in USD )
-
Available Formats
-
- Immediate download
-
$166.00Members pay $124.50
- Add to Cart
-
- Printed Edition
- Ships in 1-2 business days
-
$166.00Members pay $124.50
- Add to Cart
-
- Printed Edition + PDF
- Immediate download
-
$259.00Members pay $194.25
- Add to Cart
Customers Who Bought This Also Bought
-
ISO 6228:1980
Priced From $81.00 -
ISO 6227:1982
Priced From $81.00 -
ISO 758:1976
Priced From $54.00 -
ISO/TR 22335:2007
Priced From $124.00
About This Item
Full Description
ISO 14237:2010 specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 x 1016 atoms/cm3 to 1 x 1020 atoms/cm3.
Document History
-
ISO 14237:2010
viewing
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials- Most Recent
-
ISO 14237:2000
Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials- Historical Version